defects in device grade homoepitaxial diamond thin films grown with ultra-low ch4h2 conditions by microwave-plasma chemical vapor deposition
本文档由 ac32315 分享于2016-11-21 11:07
defects in device grade homoepitaxial diamond thin films grown with ultra-low ch4h2 conditions by microwave-plasma chemical vapor deposition
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君,已阅读到文档的结尾了呢~~