insertion of an ultrathin al2o3 interfacial layer for schottky barrier height reduction in ws2 field-effect transistors.nanoscale(2019)
本文档由 崔亚杰 分享于2019-03-10 17:53
insertion of an ultrathin al2o3 interfacial layer for schottky barrier height reduction in ws2 field-effect transistors.nanoscale(2019)
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君,已阅读到文档的结尾了呢~~