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84
7 Principles of Vapor Deposition of Thin Films First Edition-Special Sources.pdf
Principles of Vapor Deposition of Thin Films First Edition-Special Sources
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50
11 Principles of Vapor Deposition of Thin Films First Edition-Substrate Preparation.pdf
Principles of Vapor Deposition of Thin Films First Edition-Substrate Preparation
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90
Chapter 4 - Pulsed Laser Deposition of Zinc Oxide (ZnO).pdf
Chapter 4 - Pulsed Laser Deposition of Zinc Oxide (ZnO)Chapter 4 - Pulsed Laser Deposition of Zinc Oxide (ZnO)Chapter 4 - Pulsed Laser Deposition of Zinc Oxide (ZnO)
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7
Remote plasma-enhanced chemical vapour deposition of silicon nitride at atmospheric pressure.pdf
Remote plasma-enhanced chemical vapour deposition of silicon nitride at atmospheric pressureRemote plasma-enhanced chemical vapour deposition of silicon nitride at atmospheric pressureRemote plasma-enhanced chemical vapour deposition of silicon nitride at atmospheric pressure
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111
Chemical Vapor Deposition Polymerization The Growth and Properties of Parylene Thin Films.pdf
Chemical Vapor Deposition Polymerization The Growth and Properties of Parylene Thin FilmsChemical Vapor Deposition Polymerization The Growth and Properties of Parylene Thin FilmsChemical Vapor Deposition Polymerization The Growth and Properties of Parylene Thin Films
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12
68.Optimum performance solar cells using atmospheric pressure chemical vapour deposition deposited TCOs.pdf
tco film
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9
New materials and deposition techniques for highly efficient silicon thin film solar cells.pdf
This paper reviews recent efforts to provide the scientific and technological basis for costeffectiveand highly efficient thin film solar modules based on amorphous (a-Si:H) andmicrocrystalline (mc-Si:H) silicon. Textured ZnO:Al films prepared by sputtering and wetchemical etching were applied to design optimised light-trapping schemes. Necessaryprerequisite was the detailed knowledge of the relationship between film growth, structuralproperties and surface morphology obtained after etching. High rate deposition using plasmaenhanced chemical vapour deposition at 13.56MHz plasma excitation frequency wasdeveloped for mc-Si:H solar cells yielding efficiencies of 8.1% and 7.5% at deposition ratesof 5 and 9A( /s, respectively. These mc-Si:H solar cells were successfully up-scaled to a substratearea of 3030 cm2 and applied in a-Si:H/mc-Si:H tandem cells showing initial test cellefficiencies up to 11.9%.
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6
Low-Temperature Growth of Graphene by Chemical Vapor Deposition Using Solid and Liquid.pdf
LIET AL. VOL. XXX’NO. XX’000–000’XXXX CXXXX American Chemical SocietyLow-Temperature
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